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Catalog Number:
36895
CAS Number:
161337-67-3
Hafnium(IV) trifluoromethanesulfonate
Purity:
≥ 99%
Synonym(s):
Trifluoromethanesulfonic acid hafnium(IV) salt, Hafnium (IV) triflate
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$36.65 /1G
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Product Information

Hafnium(IV) trifluoromethanesulfonate is a versatile chemical compound known for its unique properties and applications in various fields. This compound serves as an effective precursor in the synthesis of hafnium-based materials, particularly in the production of high-performance ceramics and thin films. Its ability to form stable complexes makes it valuable in the semiconductor industry, where it is utilized in the fabrication of advanced electronic devices. Researchers appreciate its role in enhancing the performance of hafnium oxide films, which are critical in the development of next-generation capacitors and transistors.

In addition to its applications in electronics, Hafnium(IV) trifluoromethanesulfonate is also explored in catalysis and materials science. Its distinctive trifluoromethanesulfonate group contributes to its reactivity, making it suitable for various chemical reactions. This compound's stability and compatibility with other materials further enhance its utility in research and industrial processes. By incorporating Hafnium(IV) trifluoromethanesulfonate into their workflows, professionals can achieve improved efficiency and performance in their applications.

Synonyms
Trifluoromethanesulfonic acid hafnium(IV) salt, Hafnium (IV) triflate
CAS Number
161337-67-3
Purity
≥ 99%
Molecular Formula
(CF3SO3)4Hf
Molecular Weight
774.74
MDL Number
MFCD01321255
PubChem ID
9853707
Melting Point
350 °C
Appearance
White to yellow powder
Conditions
Store at RT
General Information
Synonyms
Trifluoromethanesulfonic acid hafnium(IV) salt, Hafnium (IV) triflate
CAS Number
161337-67-3
Purity
≥ 99%
Molecular Formula
(CF3SO3)4Hf
Molecular Weight
774.74
MDL Number
MFCD01321255
PubChem ID
9853707
Melting Point
350 °C
Appearance
White to yellow powder
Conditions
Store at RT
Properties
Additional property information coming soon!
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Safety and Regulations
Hazmat
No
Antibiotic
No
DEA-regulated
No
Warnings
-
Applications

Hafnium(IV) trifluoromethanesulfonate is widely utilized in research focused on:

  • Catalysis: This compound serves as a catalyst in various chemical reactions, particularly in organic synthesis, enhancing reaction rates and selectivity.
  • Material Science: It is used in the development of advanced materials, such as high-performance ceramics and thin films, due to its unique properties that improve durability and thermal stability.
  • Semiconductor Manufacturing: Hafnium(IV) trifluoromethanesulfonate plays a crucial role in the production of hafnium oxide, a key material for high-k dielectrics in semiconductor devices, leading to improved performance and miniaturization.
  • Analytical Chemistry: This compound is employed in various analytical techniques, including mass spectrometry, for the detection and quantification of trace elements in complex samples.
  • Biomedical Applications: Its potential in drug delivery systems is being explored, where it can enhance the solubility and bioavailability of therapeutic agents, addressing challenges in pharmaceutical formulations.

Citations